Shawn D. Lyonsmith
15Patents
3h-index
31Co-inventors
60Inventor score
Filing activity: May 29, 2002 → Dec 19, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6716719B2 | Method of forming biasable isolation regions using epitaxially grown silicon between the isolation regions | Electricity | 12 | Expired |
| US7791055B2 | Electron induced chemical etching/deposition for enhanced detection of surface defects | Physics | 11 | Active |
| US8026501B2 | Method of removing or deposting material on a surface including material selected to decorate a particle on the surface for imaging | Physics | 6 | Active |
| US10650891B2 | Non-contact electron beam probing techniques and related structures | Physics | 2 | Active |
| US6919612B2 | Biasable isolation regions using epitaxially grown silicon between the isolation regions | Electricity | 2 | Expired |
| US10403359B2 | Non-contact electron beam probing techniques and related structures | Physics | 1 | Active |
| US10672500B2 | Non-contact measurement of memory cell threshold voltage | Electricity | 1 | Active |
| US11869178B2 | System for predicting properties of structures, imager system, and related methods | Electricity | 0 | Active |
| US12167599B2 | Memory device including multiple decks of memory cells and pillars extending through the decks | Physics | 0 | Active |
| US8563435B2 | Method of reducing damage to an electron beam inspected semiconductor substrate, and methods of inspecting a semiconductor substrate | Electricity | 0 | Active |
| US11508746B2 | Semiconductor device having a stack of data lines with conductive structures on both sides thereof | Electricity | 0 | Active |
| US10872403B2 | System for predicting properties of structures, imager system, and related methods | Electricity | 0 | Active |
| US11532638B2 | Memory device including multiple decks of memory cells and pillars extending through the decks | Physics | 0 | Active |
| US10381101B2 | Non-contact measurement of memory cell threshold voltage | Electricity | 0 | Active |
| US8334209B2 | Method of reducing electron beam damage on post W-CMP wafers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.