Shigeo Irie
13Patents
3h-index
22Co-inventors
60Inventor score
Filing activity: Jun 5, 1998 → Jul 12, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9291889B2 | Photo mask and method for forming pattern using the same | Electricity | 9 | Active |
| US6500550B1 | Resin-composite aluminum profiles, heat insulating aluminum profiles, and method and apparatus for production thereof | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6855485B2 | Pattern forming method and apparatus for fabricating semiconductor device | Physics | 5 | Expired |
| US6966710B2 | Pattern forming method and apparatus for fabricating semiconductor device | Physics | 2 | Expired |
| US11061319B2 | Photomask blank and making method | Physics | 1 | Active |
| US10585345B2 | Photomask blank, method for manufacturing photomask, and mask pattern formation method | Electricity | 0 | Active |
| US6984472B2 | Exposure method and apparatus | Physics | 0 | Expired |
| US8278014B2 | Photomask and pattern formation method using the same | Physics | 0 | Active |
| US11073756B2 | Photomask blank, photomask blank making method, and photomask making method | Physics | 0 | Active |
| US6143372A | Resin-composite aluminum profiles and apparatus for production thereof | Emerging Cross-Sectional Technologies | 0 | Expired |
| US6677108B2 | Method for light exposure | Emerging Cross-Sectional Technologies | 0 | Expired |
| US8007959B2 | Photomask and pattern formation method using the same | Physics | 0 | Active |
| US7998641B2 | Photomask and pattern formation method using the same | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.