Simone Alba
11Patents
6h-index
21Co-inventors
62Inventor score
Filing activity: Dec 15, 1997 → Jul 13, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8058181B1 | Method for post-etch cleans | Electricity | 33 | Active |
| US6051443A | Method for assessing the effects of plasma treatments on wafers of semiconductor material | Electricity | 19 | Expired |
| US7390755B1 | Methods for post etch cleans | Electricity | 17 | Expired |
| US7569492B1 | Method for post-etch cleans | Electricity | 15 | Active |
| US6233046A | Method of measuring the thickness of a layer of silicon damaged by plasma etching | Physics | 12 | Expired |
| US6638833B1 | Process for the fabrication of integrated devices with reduction of damage from plasma | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6998348B2 | Method for manufacturing electronic circuits integrated on a semiconductor substrate | Electricity | 3 | Expired |
| US5888836A | Process for the repair of floating-gate non-volatile memories damaged by plasma treatment | Electricity | 2 | Expired |
| US6495455B2 | Method for enhancing selectivity between a film of a light-sensitive material and a layer to be etched in electronic semiconductor device fabrication processes | Electricity | 2 | Expired |
| US7288008B2 | Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer | Electricity | 0 | Expired |
| US7288427B2 | Method for reducing defects after a metal etching in semiconductor devices | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.