Soonwook Jung
13Patents
2h-index
26Co-inventors
46Inventor score
Filing activity: Apr 22, 2014 → Feb 21, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10504754B2 | Systems and methods for improved semiconductor etching and component protection | Electricity | 13 | Active |
| US9293336B2 | Semiconductor device and method of fabricating the same | Electricity | 7 | Active |
| US9874524B2 | In-situ spatially resolved plasma monitoring by using optical emission spectroscopy | Electricity | 2 | Active |
| US10541184B2 | Optical emission spectroscopic techniques for monitoring etching | Electricity | 1 | Active |
| US11587765B2 | Plasma ignition optimization in semiconductor processing chambers | Electricity | 1 | Active |
| US10593560B2 | Magnetic induction plasma source for semiconductor processes and equipment | Electricity | 1 | Active |
| US10522371B2 | Systems and methods for improved semiconductor etching and component protection | Electricity | 1 | Active |
| US10607832B2 | Method and apparatus for forming a thin layer | Electricity | 0 | Active |
| US9922840B2 | Adjustable remote dissociation | Electricity | 0 | Active |
| US12310055B2 | Semiconductor device and method of fabricating the same | Electricity | 0 | Active |
| US12340979B2 | Semiconductor processing chamber for improved precursor flow | Electricity | 0 | Active |
| US11735441B2 | Systems and methods for improved semiconductor etching and component protection | Electricity | 0 | Active |
| US11894217B2 | Plasma ignition optimization in semiconductor processing chambers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.