Takahiro Arakawa
17Patents
5h-index
32Co-inventors
66Inventor score
Filing activity: Sep 15, 1989 → Apr 26, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6693612B1 | Liquid crystal display apparatus and its luminance control method | Physics | 60 | Expired |
| US6388632B1 | Slot antenna used for plasma surface processing apparatus | Electricity | 36 | Expired |
| US7719689B2 | AE/ultrasound detection system, and material monitoring apparatus and nondestructive inspection apparatus equipped the system | Physics | 26 | Active |
| US6640632B1 | Ultrasonic flaw detection method and apparatus | Physics | 24 | Expired |
| US4961347A | Probe for ultrasonic flaw detectors | Electricity | 9 | Expired |
| US7899792B2 | Data-mismatch resolving apparatus, data-mismatch resolving method, and computer product | Physics | 3 | Active |
| US8308897B2 | Plasma processing apparatus and plasma processing method | Electricity | 2 | Expired |
| US8513137B2 | Plasma processing apparatus and plasma processing method | Electricity | 1 | Active |
| USD1043594S1 | Semiconductor device | General | 0 | Active |
| US8414782B2 | Process for producing fluorocarbon microstructure, fluorocarbon microstructure, and microsystem | Emerging Cross-Sectional Technologies | 0 | Active |
| US10066264B2 | Method for analyzing target nucleic acid, kit, and analyzer | Chemistry; Metallurgy | 0 | Active |
| USD1052545S1 | Semiconductor device | General | 0 | Active |
| US8741779B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| USD1043595S1 | Semiconductor device | General | 0 | Active |
| US10345268B2 | Ultrasonic inspection device and method | Physics | 0 | Active |
| US11293905B2 | Phased-array flaw-detection device and method | Physics | 0 | Active |
| US10957803B2 | Bidirectional Zener diode and method for manufacturing bidirectional Zener diode | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.