Inventor · Dresden, DE

Tim Baldauf

7Patents
3h-index
7Co-inventors
42Inventor score

Filing activity: Aug 24, 2011 → Jun 20, 2017

Most-cited inventions

PatentTitleAreaCited byStatus
US8912606B2 Integrated circuits having protruding source and drain regions and methods for forming integrated circuits Electricity 14 Active
US8835255B2 Method of forming a semiconductor structure including a vertical nanowire Electricity 4 Active
US8580643B2 Threshold voltage adjustment in a Fin transistor by corner implantation Electricity 3 Active
US10347760B2 Reconfigurable nanowire field effect transistor, a nanowire array and an integrated circuit thereof Electricity 2 Active
US9484407B2 Methods of forming a nanowire transistor device Electricity 0 Active
US8941187B2 Strain engineering in three-dimensional transistors based on strained isolation material Electricity 0 Active
US8916928B2 Threshold voltage adjustment in a fin transistor by corner implantation Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.