Tim Baldauf
7Patents
3h-index
7Co-inventors
42Inventor score
Filing activity: Aug 24, 2011 → Jun 20, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8912606B2 | Integrated circuits having protruding source and drain regions and methods for forming integrated circuits | Electricity | 14 | Active |
| US8835255B2 | Method of forming a semiconductor structure including a vertical nanowire | Electricity | 4 | Active |
| US8580643B2 | Threshold voltage adjustment in a Fin transistor by corner implantation | Electricity | 3 | Active |
| US10347760B2 | Reconfigurable nanowire field effect transistor, a nanowire array and an integrated circuit thereof | Electricity | 2 | Active |
| US9484407B2 | Methods of forming a nanowire transistor device | Electricity | 0 | Active |
| US8941187B2 | Strain engineering in three-dimensional transistors based on strained isolation material | Electricity | 0 | Active |
| US8916928B2 | Threshold voltage adjustment in a fin transistor by corner implantation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.