Travis Koh
14Patents
6h-index
26Co-inventors
58Inventor score
Filing activity: Jul 24, 2014 → Jul 16, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10373804B2 | System for tunable workpiece biasing in a plasma reactor | Electricity | 74 | Active |
| US10312048B2 | Creating ion energy distribution functions (IEDF) | Electricity | 39 | Active |
| US10904996B2 | Substrate support with electrically floating power supply | Electricity | 38 | Active |
| US10714372B2 | System for coupling a voltage to portions of a substrate | Electricity | 36 | Active |
| US10685807B2 | Creating ion energy distribution functions (IEDF) | Electricity | 32 | Active |
| US10923320B2 | System for tunable workpiece biasing in a plasma reactor | Electricity | 30 | Active |
| US9613783B2 | Method and apparatus for controlling a magnetic field in a plasma chamber | Electricity | 5 | Active |
| US11069504B2 | Creating ion energy distribution functions (IEDF) | Electricity | 3 | Active |
| US10115566B2 | Method and apparatus for controlling a magnetic field in a plasma chamber | Electricity | 3 | Active |
| US11728124B2 | Creating ion energy distribution functions (IEDF) | Electricity | 2 | Active |
| US12094707B2 | Plasma enhanced CVD with periodic high voltage bias | Chemistry; Metallurgy | 0 | Active |
| US9659751B2 | System and method for selective coil excitation in inductively coupled plasma processing reactors | Electricity | 0 | Active |
| US10840086B2 | Plasma enhanced CVD with periodic high voltage bias | Chemistry; Metallurgy | 0 | Active |
| US10249479B2 | Magnet configurations for radial uniformity tuning of ICP plasmas | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.