Vanessa Faune
6Patents
1h-index
17Co-inventors
40Inventor score
Filing activity: Nov 27, 2017 → Sep 9, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11289312B2 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Electricity | 2 | Active |
| US11024490B2 | Magnetron having enhanced target cooling configuration | Electricity | 1 | Active |
| US11049701B2 | Biased cover ring for a substrate processing system | Electricity | 1 | Active |
| US11473189B2 | Method for particle removal from wafers through plasma modification in pulsed PVD | Electricity | 1 | Active |
| US11935732B2 | Process kit geometry for particle reduction in PVD processes | Electricity | 0 | Active |
| US11932934B2 | Method for particle removal from wafers through plasma modification in pulsed PVD | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.