Wayne Bather
7Patents
3h-index
19Co-inventors
54Inventor score
Filing activity: Feb 4, 2000 → Dec 13, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7838370B2 | Highly selective liners for semiconductor fabrication | Electricity | 42 | Active |
| US6812073B2 | Source drain and extension dopant concentration | Electricity | 13 | Expired |
| US6686283B1 | Shallow trench isolation planarization using self aligned isotropic etch | Electricity | 4 | Expired |
| US7384861B2 | Strain modulation employing process techniques for CMOS technologies | Electricity | 3 | Expired |
| US7772094B2 | Implant damage of layer for easy removal and reduced silicon recess | Electricity | 1 | Active |
| US8859377B2 | Damage implantation of a cap layer | Electricity | 1 | Active |
| US12154987B2 | Damage implantation of cap layer | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.