Witold Kula
101Patents
21h-index
45Co-inventors
90Inventor score
Filing activity: Jul 12, 2000 → Jun 13, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8852760B2 | Free layer with high thermal stability for magnetic device applications by insertion of a boron dusting layer | Emerging Cross-Sectional Technologies | 94 | Active |
| US7750421B2 | High performance MTJ element for STT-RAM and method for making the same | Electricity | 88 | Active |
| US7863060B2 | Method of double patterning and etching magnetic tunnel junction structures for spin-transfer torque MRAM devices | Electricity | 81 | Active |
| US8722543B2 | Composite hard mask with upper sacrificial dielectric layer for the patterning and etching of nanometer size MRAM devices | Emerging Cross-Sectional Technologies | 75 | Active |
| US7936027B2 | Method of MRAM fabrication with zero electrical shorting | Electricity | 74 | Active |
| US7696551B2 | Composite hard mask for the etching of nanometer size magnetic multilayer based device | Emerging Cross-Sectional Technologies | 71 | Active |
| US8592927B2 | Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications | Electricity | 67 | Active |
| US8138561B2 | Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM | Electricity | 53 | Active |
| US9466789B2 | Method of making a high thermal stability reference structure with out-of-plane anisotropy for magnetic device applications | Emerging Cross-Sectional Technologies | 52 | Active |
| US8749003B2 | High performance MTJ element for conventional MRAM and for STT-RAM and a method for making the same | Electricity | 51 | Active |
| US8492169B2 | Magnetic tunnel junction for MRAM applications | Electricity | 49 | Active |
| US8080432B2 | High performance MTJ element for STT-RAM and method for making the same | Electricity | 45 | Active |
| US9006704B2 | Magnetic element with improved out-of-plane anisotropy for spintronic applications | Electricity | 45 | Active |
| US8541855B2 | Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications | Physics | 41 | Active |
| US8946834B2 | High thermal stability free layer with high out-of-plane anisotropy for magnetic device applications | Emerging Cross-Sectional Technologies | 38 | Active |
| US8871365B2 | High thermal stability reference structure with out-of-plane aniotropy to magnetic device applications | Emerging Cross-Sectional Technologies | 27 | Active |
| US8609262B2 | Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM application | Emerging Cross-Sectional Technologies | 27 | Active |
| US9472752B2 | High thermal stability reference structure with out-of-plane anisotropy for magnetic device applications | Emerging Cross-Sectional Technologies | 27 | Active |
| US8923038B2 | Memory cells, semiconductor device structures, memory systems, and methods of fabrication | Electricity | 26 | Active |
| US7672093B2 | Hafnium doped cap and free layer for MRAM device | Emerging Cross-Sectional Technologies | 25 | Active |
| US8921961B2 | Storage element for STT MRAM applications | Electricity | 21 | Active |
| US9048411B2 | Multilayers having reduced perpendicular demagnetizing field using moment dilution for spintronic applications | Electricity | 18 | Active |
| US8372661B2 | High performance MTJ element for conventional MRAM and for STT-RAM and a method for making the same | Electricity | 17 | Active |
| US7205164B1 | Methods for fabricating magnetic cell junctions and a structure resulting and/or used for such methods | Electricity | 14 | Expired |
| US7713755B1 | Field angle sensor fabricated using reactive ion etching | Electricity | 13 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.