Maintaining coercive field after high temperature anneal for magnetic device applications with perpendicular magnetic anisotropy
US10014465B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2017 |
| Grant date | Jul 3, 2018 |
| Priority date | — |
| Expiry date | Apr 3, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/85
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic tunnel junction with perpendicular magnetic anisotropy (PMA MTJ) is disclosed wherein a free layer has an interface with a tunnel barrier and a second interface with an oxide layer. A lattice-matching layer adjoins an opposite side of the oxide layer with respect to the free layer and is comprised of CoXFeYNiZLWMV or CoXFeYNiZLW wherein L is one of B, Zr, Nb, Hf, Mo, Cu, Cr, Mg, Ta, Ti, Au, Ag, or P, and M is one of Mo, Mg, Ta, Cr, W, or V, (x+y+z+w+v)=100 atomic %, x+y>0, and each of v and w are >0. The lattice-matching layer grows a BCC structure during annealing at about 400° C. thereby promoting BCC structure growth in the oxide layer. As a result, free layer PMA is enhanced and maintained to yield improved thermal stability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.