Patent · US Active

Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow

US10131994B2 · kind B2 · utility

2Cited by

21References

13Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Andrew Nguyen · San Jose, US
Kenneth S. Collins · San Jose, US
Kartik Ramaswamy · San Jose, US
Shahid Rauf · Pleasanton, US
James D. Carducci · Sunnyvale, US
Douglas A. Buchberger, Jr. · Livermore, US
Ankur Agarwal · Mountain View, US
Jason A. Kenney · Sunnyvale, US
Leonid Dorf · San Jose, US
Ajit Balakrishna · Sunnyvale, US
Richard Fovell · San Jose, US

Key dates

Filing date	Nov 1, 2012
Grant date	Nov 20, 2018
Priority date	—
Expiry date	Jun 6, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/46
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.