Semiconductor device and method of forming the semiconductor device
US10381437B2 · kind B2 · utility
4Cited by
10References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 30, 2017 |
| Grant date | Aug 13, 2019 |
| Priority date | — |
| Expiry date | Jan 3, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/6757
Abstract
A semiconductor device includes a fin structure including a cylindrical shape, an inner gate formed inside the fin structure, and an outer gate formed outside the fin structure and connected to the inner gate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.