Capacitive sensor for chamber condition monitoring

US11581206B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Yaoling Pan · Santa Clara, US
• Patrick Tae · Sunnyvale, US
• Leonard Tedeschi · San Jose, US
• Jennifer Y. Sun · Mountain View, US
• Philip Allan Kraus · San Jose, US
• Xiaopu Li · San Jose, US
• Kallol Bera · San Jose, US
• Michael D. Willwerth · Campbell, US
• Albert Barrett Hicks, III · Sunnyvale, US
• Lisa J. Enman · Sunnyvale, US
• Mark Saly · Santa Clara, US
• Daniel T. McCormick · Richmond, US

Key dates

• Filing date: Mar 6, 2020
• Grant date: Feb 14, 2023
• Expiry date: Jul 23, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G05B2219/32177
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Embodiments disclosed herein comprise a sensor. In an embodiment, the sensor comprises a substrate having a first surface and a second surface opposite from the first surface. In an embodiment, the sensor further comprises a first electrode over the first surface of the substrate, and a second electrode over the first surface of the substrate and adjacent to the first electrode. In an embodiment, the sensor further comprises a barrier layer over the first electrode and the second electrode.