Autonomous substrate processing system
US11709477B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2021 |
| Grant date | Jul 25, 2023 |
| Priority date | — |
| Expiry date | Apr 6, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N3/04
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A substrate processing system comprises one or more transfer chambers; a plurality of process chambers connected to the one or more transfer chambers; and a computing device connected to each of the plurality of process chambers. The computing device is to receive first measurements generated by sensors of a first process chamber during or after a process is performed within the first process chamber; determine that the first process chamber is due for maintenance based on processing the first measurements using a first trained machine learning model; after maintenance has been performed on the first process chamber, receive second measurements generated by the sensors during or after a seasoning process is performed within the first process chamber; and determine that the first process chamber is ready to be brought back into service based on processing the second measurements using a second trained machine learning model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.