Gas delivery apparatus for atomic layer deposition

US7780785B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Ling Chen · Sunnyvale, US
• Vincent Ku · San Jose, US
• Dien-Yeh Wu · San Jose, US
• Hua Chung · San Jose, US
• Alan Ouye · San Mateo, US
• Norman Nakashima · Lake Oswego, US
• Mei Chang · San Jose, US

Key dates

• Filing date: Oct 25, 2002
• Grant date: Aug 24, 2010
• Expiry date: Oct 20, 2023

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/0396
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus and method for performing a cyclical layer deposition process, such as atomic layer deposition is provided. In one aspect, the apparatus includes a substrate support having a substrate receiving surface, and a chamber lid comprising a tapered passageway extending from a central portion of the chamber lid and a bottom surface extending from the passageway to a peripheral portion of the chamber lid, the bottom surface shaped and sized to substantially cover the substrate receiving surface. The apparatus also includes one or more valves coupled to the gradually expanding channel, and one or more gas sources coupled to each valve.