Vincent Ku
65Patents
23h-index
52Co-inventors
91Inventor score
Filing activity: Sep 11, 1997 → Nov 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6916398B2 | Gas delivery apparatus and method for atomic layer deposition | Electricity | 560 | Expired |
| US7204886B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 471 | Expired |
| US7591907B2 | Apparatus for hybrid chemical processing | Chemistry; Metallurgy | 350 | Active |
| US6258170A | Vaporization and deposition apparatus | Emerging Cross-Sectional Technologies | 224 | Expired |
| US6302965A | Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces | Chemistry; Metallurgy | 147 | Expired |
| US6838125B2 | Method of film deposition using activated precursor gases | Chemistry; Metallurgy | 109 | Expired |
| US6772072B2 | Method and apparatus for monitoring solid precursor delivery | Chemistry; Metallurgy | 104 | Expired |
| US7186385B2 | Apparatus for providing gas to a processing chamber | Emerging Cross-Sectional Technologies | 86 | Expired |
| US6905541B2 | Method and apparatus of generating PDMAT precursor | Emerging Cross-Sectional Technologies | 85 | Expired |
| US6939801B2 | Selective deposition of a barrier layer on a dielectric material | Electricity | 54 | Expired |
| US6955211B2 | Method and apparatus for gas temperature control in a semiconductor processing system | Electricity | 54 | Expired |
| US6972267B2 | Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor | Electricity | 52 | Expired |
| US7780785B2 | Gas delivery apparatus for atomic layer deposition | Emerging Cross-Sectional Technologies | 51 | Expired |
| US10226265B2 | Shock wave device with polarity switching | Human Necessities | 50 | Active |
| US9044575B2 | Catheters with enhanced flexibility and associated devices, systems, and methods | Human Necessities | 48 | Active |
| US6066209A | Cold trap | Emerging Cross-Sectional Technologies | 46 | Expired |
| US6527865B1 | Temperature controlled gas feedthrough | Electricity | 44 | Expired |
| US7402210B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 42 | Active |
| US7228873B2 | Valve design and configuration for fast delivery system | Emerging Cross-Sectional Technologies | 41 | Expired |
| US7066194B2 | Valve design and configuration for fast delivery system | Emerging Cross-Sectional Technologies | 39 | Expired |
| US7270709B2 | Method and apparatus of generating PDMAT precursor | Emerging Cross-Sectional Technologies | 36 | Expired |
| US11026707B2 | Shock wave device with polarity switching | Human Necessities | 27 | Active |
| US8070879B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 24 | Active |
| US7699023B2 | Gas delivery apparatus for atomic layer deposition | Emerging Cross-Sectional Technologies | 23 | Active |
| US6299692A | Head for vaporizing and flowing various precursor materials onto semiconductor wafers during chemical vapor deposition | Chemistry; Metallurgy | 19 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.