Plasma reactor with reduced electrical skew using electrical bypass elements
US7988815B2 · kind B2 · utility
8Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2007 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | Apr 17, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32834
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.