Apparatus for radial delivery of gas to a chamber and methods of use thereof
US8562742B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 19, 2010 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Feb 8, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/8593
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus for the delivery of a gas to a chamber and methods of use thereof are provided herein. In some embodiments, a gas distribution system for a process chamber may include a body having a first surface configured to couple the body to an interior surface of a process chamber, the body having a opening disposed through the body; a flange disposed proximate a first end of the opening opposite the first surface of the body, the flange extending inwardly into the opening and configured to support a window thereon; and a plurality of gas distribution channels disposed within the body and fluidly coupling a channel disposed within the body and around the opening to a plurality of holes disposed in the flange, wherein the plurality of holes are disposed radially about the flange.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.