Thermal processing apparatus
US8569187B2 · kind B2 · utility
1Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2011 |
| Grant date | Oct 29, 2013 |
| Priority date | — |
| Expiry date | Jul 29, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0057
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.