Symmetrical inductively coupled plasma source with symmetrical flow chamber
US9745663B2 · kind B2 · utility
3Cited by
21References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2012 |
| Grant date | Aug 29, 2017 |
| Priority date | — |
| Expiry date | May 21, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.