Patent · US Active

Inductively coupled plasma source with multiple dielectric windows and window-supporting structure

US9896769B2 · kind B2 · utility

3Cited by

21References

15Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Andrew Nguyen · San Jose, US
Kenneth S. Collins · San Jose, US
Kartik Ramaswamy · San Jose, US
Shahid Rauf · Pleasanton, US
James D. Carducci · Sunnyvale, US
Douglas A. Buchberger, Jr. · Livermore, US
Ankur Agarwal · Mountain View, US
Jason A. Kenney · Sunnyvale, US
Leonid Dorf · San Jose, US
Ajit Balakrishna · Sunnyvale, US
Richard Fovell · San Jose, US

Key dates

Filing date	Nov 1, 2012
Grant date	Feb 20, 2018
Priority date	—
Expiry date	Jul 22, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/46
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.