Abaneshwar Prasad
19Patents
15h-index
3Co-inventors
67Inventor score
Filing activity: Oct 28, 2002 → Apr 11, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6913517B2 | Microporous polishing pads | Performing Operations; Transporting | 56 | Expired |
| US6884156B2 | Multi-layer polishing pad material for CMP | Performing Operations; Transporting | 38 | Expired |
| US7264641B2 | Polishing pad comprising biodegradable polymer | Electricity | 35 | Expired |
| US7699684B2 | CMP porous pad with component-filled pores | Performing Operations; Transporting | 35 | Active |
| US8075372B2 | Polishing pad with microporous regions | Performing Operations; Transporting | 34 | Active |
| US7435165B2 | Transparent microporous materials for CMP | Performing Operations; Transporting | 33 | Expired |
| US6935931B2 | Microporous polishing pads | Performing Operations; Transporting | 32 | Expired |
| US6998166B2 | Polishing pad with oriented pore structure | Emerging Cross-Sectional Technologies | 32 | Expired |
| US6896593B2 | Microporous polishing pads | Performing Operations; Transporting | 31 | Expired |
| US7267607B2 | Transparent microporous materials for CMP | Performing Operations; Transporting | 31 | Expired |
| US7311862B2 | Method for manufacturing microporous CMP materials having controlled pore size | Performing Operations; Transporting | 28 | Expired |
| US7435161B2 | Multi-layer polishing pad material for CMP | Performing Operations; Transporting | 27 | Expired |
| US7195544B2 | CMP porous pad with component-filled pores | Performing Operations; Transporting | 26 | Expired |
| US7204742B2 | Polishing pad comprising hydrophobic region and endpoint detection port | Performing Operations; Transporting | 23 | Expired |
| US6960120B2 | CMP pad with composite transparent window | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7059936B2 | Low surface energy CMP pad | Performing Operations; Transporting | 7 | Expired |
| US6899598B2 | Microporous polishing pads | Performing Operations; Transporting | 5 | Expired |
| US9156125B2 | Polishing pad with light-stable light-transmitting region | Performing Operations; Transporting | 1 | Active |
| US7686994B2 | Method of preparing a conductive film | Emerging Cross-Sectional Technologies | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.