Anne E. Sanderfer
9Patents
3h-index
13Co-inventors
43Inventor score
Filing activity: Jul 21, 1998 → Mar 19, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6387820B1 | BC13/AR chemistry for metal overetching on a high density plasma etcher | Emerging Cross-Sectional Technologies | 56 | Expired |
| US6159863A | Insitu hardmask and metal etch in a single etcher | Electricity | 13 | Expired |
| US6274504A | Minimizing metal corrosion during post metal solvent clean | Chemistry; Metallurgy | 4 | Expired |
| US6333263A | Method of reducing stress corrosion induced voiding of patterned metal layers | Electricity | 3 | Expired |
| US6297065A | Method to rework device with faulty metal stack layer | Electricity | 2 | Expired |
| US6174819A | Low temperature photoresist removal for rework during metal mask formation | Electricity | 2 | Expired |
| US6066546A | Method to minimize particulate induced clamping failures | Emerging Cross-Sectional Technologies | 1 | Expired |
| US6642152B1 | Method for ultra thin resist linewidth reduction using implantation | Electricity | 1 | Expired |
| US6251776A | Plasma treatment to reduce stress corrosion induced voiding of patterned metal layers | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.