Chawon Koh
9Patents
1h-index
30Co-inventors
43Inventor score
Filing activity: Aug 8, 2013 → May 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10353290B2 | Photoresist composition for extreme ultraviolet and method of forming photoresist pattern using the same | Electricity | 1 | Active |
| US11599021B2 | Photoresist compositions and methods for fabricating semiconductor devices using the same | Physics | 0 | Active |
| US9158204B2 | Photo lithographic rinse solution and method of manufacturing a semiconductor device using the same | Electricity | 0 | Active |
| US12360451B2 | Method of manufacturing semiconductor device | Physics | 0 | Active |
| US9564325B2 | Methods of fabricating a semiconductor device | Electricity | 0 | Active |
| US11923209B2 | Substrate processing apparatus and substrate processing method | Electricity | 0 | Active |
| US11189503B2 | Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying system | Electricity | 0 | Active |
| US12112948B2 | Method of manufacturing integrated circuit device using a metal-containing photoresist composition | Electricity | 0 | Active |
| US11327398B2 | Photoresist compositions and methods for fabricating semiconductor devices using the same | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.