Daniel B. Aubertine
20Patents
6h-index
19Co-inventors
62Inventor score
Filing activity: Mar 28, 2007 → Jan 8, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9012284B2 | Nanowire transistor devices and forming techniques | Electricity | 39 | Active |
| US8847281B2 | High mobility strained channels for fin-based transistors | Electricity | 39 | Active |
| US7663192B2 | CMOS device and method of manufacturing same | Electricity | 23 | Active |
| US9064944B2 | Nanowire transistor with underlayer etch stops | Electricity | 21 | Active |
| US8957476B2 | Conversion of thin transistor elements from silicon to silicon germanium | Electricity | 12 | Active |
| US9184294B2 | High mobility strained channels for fin-based transistors | Electricity | 8 | Active |
| US9653584B2 | Pre-sculpting of Si fin elements prior to cladding for transistor channel applications | Electricity | 5 | Active |
| US8779477B2 | Enhanced dislocation stress transistor | Electricity | 4 | Active |
| US9614060B2 | Nanowire transistor with underlayer etch stops | Electricity | 1 | Active |
| US11171058B2 | Self-aligned 3-D epitaxial structures for MOS device fabrication | Electricity | 0 | Active |
| US10014412B2 | Pre-sculpting of Si fin elements prior to cladding for transistor channel applications | Electricity | 0 | Active |
| US9660078B2 | Enhanced dislocation stress transistor | Electricity | 0 | Active |
| US10396203B2 | Pre-sculpting of Si fin elements prior to cladding for transistor channel applications | Electricity | 0 | Active |
| US12294027B2 | Semiconductor device having doped epitaxial region and its methods of fabrication | Electricity | 0 | Active |
| US9385221B2 | Nanowire transistor with underlayer etch stops | Electricity | 0 | Active |
| US9231076B2 | Enhanced dislocation stress transistor | Electricity | 0 | Active |
| US10084087B2 | Enhanced dislocation stress transistor | Electricity | 0 | Active |
| US10559689B2 | Crystallized silicon carbon replacement material for NMOS source/drain regions | Electricity | 0 | Active |
| US7833883B2 | Precursor gas mixture for depositing an epitaxial carbon-doped silicon film | Electricity | 0 | Active |
| US9076814B2 | Enhanced dislocation stress transistor | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.