Diego Feijoo
10Patents
2h-index
16Co-inventors
43Inventor score
Filing activity: May 3, 2007 → Nov 13, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7938911B2 | Process for cleaning a semiconductor wafer using a cleaning solution | Chemistry; Metallurgy | 7 | Active |
| US8070882B2 | Method for the wet-chemical treatment of a semiconductor wafer | Electricity | 6 | Active |
| US7538008B2 | Method for producing a layer structure | Electricity | 1 | Active |
| US8580046B2 | Method for the treatment of a semiconductor wafer | Electricity | 0 | Active |
| US8685270B2 | Method for producing a semiconductor wafer | Electricity | 0 | Active |
| US8372213B2 | Method for the treatment of a semiconductor wafer | Electricity | 0 | Active |
| US7988876B2 | Method for reducing and homogenizing the thickness of a semiconductor layer which lies on the surface of an electrically insulating material | Electricity | 0 | Active |
| US7799692B2 | Method and apparatus for the treatment of a semiconductor wafer | Electricity | 0 | Active |
| US9230794B2 | Process for cleaning, drying and hydrophilizing a semiconductor wafer | Chemistry; Metallurgy | 0 | Active |
| US7829467B2 | Method for producing a polished semiconductor | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.