Inventor · Yongin-si, KR

DongSub Choi

16Patents

6h-index

27Co-inventors

62Inventor score

Filing activity: Apr 22, 2008 → Aug 10, 2018

Most-cited inventions

Patent	Title	Area	Cited by	Status
US8175831B2	Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers	Electricity	34	Active
US8111376B2	Feedforward/feedback litho process control of stress and overlay	Physics	19	Active
US9093458B2	Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets	Electricity	17	Active
US9116442B2	Feedforward/feedback litho process control of stress and overlay	Physics	15	Active
US9709903B2	Overlay target geometry for measuring multiple pitches	Physics	12	Active
US10295993B2	Method and system for detecting and correcting problematic advanced process control parameters	Emerging Cross-Sectional Technologies	8	Active
US8655469B2	Advanced process control optimization	Physics	3	Active
US10095121B2	Optimizing the utilization of metrology tools	Physics	3	Active
US10409171B2	Overlay control with non-zero offset prediction	Physics	2	Active
US8804137B2	Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability	Electricity	2	Active
US9476838B2	Hybrid imaging and scatterometry targets	Physics	2	Active
US10649447B2	Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers	Electricity	1	Active
US9466100B2	Focus monitoring method using asymmetry embedded imaging target	Physics	1	Active
US10303835B2	Method and apparatus for direct self assembly in target design and production	Emerging Cross-Sectional Technologies	1	Active
US9651943B2	Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers	Electricity	0	Active
US10725385B2	Optimizing the utilization of metrology tools	Physics	0	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.