Eric Jacquinot
16Patents
5h-index
17Co-inventors
63Inventor score
Filing activity: Jun 4, 1992 → Mar 6, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5795556A | Xerogels and process for their preparation | Chemistry; Metallurgy | 34 | Expired |
| US5256725A | Polymerizable luminescent fluid composition and its use | Chemistry; Metallurgy | 12 | Expired |
| US6126518A | Chemical mechanical polishing process for layers of semiconductor or isolating materials | Electricity | 10 | Expired |
| US6043159A | Chemical mechanical polishing process for layers of isolating materials based on silicon derivatives or silicon | Chemistry; Metallurgy | 9 | Expired |
| US7629391B2 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereof | Chemistry; Metallurgy | 9 | Expired |
| US6302765A | Process for mechanical chemical polishing of a layer in a copper-based material | Electricity | 5 | Expired |
| US5419846A | Stable granules for detergents, cleaning agents and disinfectants | Chemistry; Metallurgy | 5 | Expired |
| US6136912A | Silicoacrylic compositions, preparation process and use for obtaining coatings which are hardenable thermally or by radiation | Chemistry; Metallurgy | 5 | Expired |
| US6386950B1 | Process for mechanical chemical polishing of layer of aluminium or aluminium alloy conducting material | Chemistry; Metallurgy | 4 | Expired |
| US7144814B2 | Abrasive composition for the integrated circuits electronics industry | Electricity | 2 | Expired |
| US6362108B1 | Composition for mechanical chemical polishing of layers in an insulating material based on a polymer with a low dielectric constant | Chemistry; Metallurgy | 1 | Expired |
| US7252695B2 | Abrasive composition for the integrated circuit electronics industry | Electricity | 0 | Active |
| US8153107B2 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereof | Chemistry; Metallurgy | 0 | Active |
| US7077727B2 | Process for chemical-mechanical polishing of metal substrates | Chemistry; Metallurgy | 0 | Expired |
| US7651719B2 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereof | Chemistry; Metallurgy | 0 | Active |
| US8308985B2 | Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral PH and applications thereof | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.