Ernest E. Allen
17Patents
4h-index
33Co-inventors
60Inventor score
Filing activity: Dec 21, 1998 → Jan 8, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6347919B1 | Wafer processing chamber having separable upper and lower halves | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6231054A | Elastomeric sliding seal for vacuum bellows | Mechanical Engineering; Lighting; Heating | 16 | Expired |
| US6429139B1 | Serial wafer handling mechanism | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6065499A | Lateral stress relief mechanism for vacuum bellows | Electricity | 7 | Expired |
| US10325752B1 | Performance extraction set | Electricity | 4 | Active |
| US8563407B2 | Dual sided workpiece handling | Physics | 2 | Active |
| US8659229B2 | Plasma attenuation for uniformity control | Electricity | 2 | Active |
| US9287085B2 | Processing apparatus and method of treating a substrate | Electricity | 1 | Active |
| US10569299B2 | Hydrophobic shafts for use in process chambers | Performing Operations; Transporting | 1 | Active |
| US9865433B1 | Gas injection system for ion beam device | Electricity | 1 | Active |
| US10276340B1 | Low particle capacitively coupled components for workpiece processing | Electricity | 1 | Active |
| US10974276B2 | Hydrophobic shafts for use in process chambers | Performing Operations; Transporting | 0 | Active |
| US9589769B2 | Apparatus and method for efficient materials use during substrate processing | Electricity | 0 | Active |
| US8941082B2 | Dual sided workpiece handling | Physics | 0 | Active |
| US10395969B2 | Transparent halo for reduced particle generation | Electricity | 0 | Active |
| US10062548B2 | Gas injection system for ion beam device | Electricity | 0 | Active |
| US11424112B2 | Transparent halo assembly for reduced particle generation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.