Hiroaki Ishimura
8Patents
4h-index
20Co-inventors
53Inventor score
Filing activity: Mar 7, 2001 → Aug 5, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7224568B2 | Plasma processing method and plasma processing apparatus | Electricity | 9 | Expired |
| US9099349B2 | Semiconductor device manufacturing method | Electricity | 8 | Active |
| US6709984B2 | Method for manufacturing semiconductor device | Electricity | 4 | Expired |
| US6617255B2 | Plasma processing method for working the surface of semiconductor devices | Electricity | 4 | Expired |
| US8207066B2 | Dry etching method | Electricity | 3 | Active |
| US7098138B2 | Plasma processing method for working the surface of semiconductor devices | Electricity | 1 | Expired |
| US9018075B2 | Plasma processing method | Electricity | 0 | Active |
| US8486291B2 | Plasma processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.