Hisaki Abe
9Patents
7h-index
14Co-inventors
56Inventor score
Filing activity: Dec 11, 1991 → Feb 28, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5242879A | Active carbon materials, process for the preparation thereof and the use thereof | Chemistry; Metallurgy | 140 | Expired |
| US6323169A | Resist stripping composition and process for stripping resist | Chemistry; Metallurgy | 42 | Expired |
| US6638694B2 | Resist stripping agent and process of producing semiconductor devices using the same | Physics | 33 | Expired |
| US6440326B1 | Photoresist removing composition | Electricity | 19 | Expired |
| US6686322B1 | Cleaning agent and cleaning process using the same | Electricity | 18 | Expired |
| US5338462A | Active carbon materials, process for the preparation thereof and the use thereof | Chemistry; Metallurgy | 16 | Expired |
| US6458517B2 | Photoresist stripping composition and process for stripping photoresist | Physics | 12 | Expired |
| US6815150B2 | Photoresist stripping composition and process for stripping resist | Physics | 5 | Expired |
| US6500270B2 | Resist film removing composition and method for manufacturing thin film circuit element using the composition | Chemistry; Metallurgy | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.