Jin Kyung Jo
9Patents
1h-index
9Co-inventors
33Inventor score
Filing activity: May 24, 2019 → Jun 14, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10836962B2 | Etchant composition, method of etching insulating film, method of manufacturing semiconductor device, and silane compound | Electricity | 1 | Active |
| US11028321B2 | Etching composition, method for etching insulating layer of semiconductor devices and method for preparing semiconductor devices | Chemistry; Metallurgy | 0 | Active |
| US11236116B2 | Silicon compound | Chemistry; Metallurgy | 0 | Active |
| US12146092B2 | Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices | Electricity | 0 | Active |
| US11186772B2 | Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices | Electricity | 0 | Active |
| US11066601B2 | Composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds | Electricity | 0 | Active |
| US12116520B2 | Composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds | Electricity | 0 | Active |
| US10941341B2 | Etching composition additive, method for preparing the same and etching composition comprising the same | Electricity | 0 | Active |
| US11365350B2 | Silane compound | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.