Kyle S. Lebouitz
17Patents
9h-index
8Co-inventors
65Inventor score
Filing activity: Jun 24, 1996 → Jul 23, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6972199B2 | Method of making a cutting instrument having integrated sensors | Human Necessities | 1,524 | Expired |
| US6494882B1 | Cutting instrument having integrated sensors | Human Necessities | 994 | Expired |
| US5928207A | Microneedle with isotropically etched tip, and method of fabricating such a device | Human Necessities | 214 | Expired |
| US6187210A | Epidermal abrasion device with isotropically etched tips, and method of fabricating such a device | Human Necessities | 154 | Expired |
| US5919364A | Microfabricated filter and shell constructed with a permeable membrane | Performing Operations; Transporting | 96 | Expired |
| US6478974B1 | Microfabricated filter and shell constructed with a permeable membrane | Performing Operations; Transporting | 59 | Expired |
| US5970998A | Microfabricated cantilever ratchet valve, and method for using same | Emerging Cross-Sectional Technologies | 53 | Expired |
| US6887337B2 | Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto | Electricity | 25 | Expired |
| US6610235B1 | Method of fabricating epidermal abrasion device | Performing Operations; Transporting | 17 | Expired |
| US7638435B2 | Pulsed etching cooling | Electricity | 4 | Active |
| US8377253B2 | Pulsed etching cooling | Electricity | 2 | Active |
| US6566725B1 | Thermal isolation using vertical structures | Performing Operations; Transporting | 2 | Expired |
| US10079150B2 | Method and apparatus for dry gas phase chemically etching a structure | Electricity | 2 | Active |
| US8257602B2 | Pulsed-continuous etching | Electricity | 1 | Active |
| US6653239B2 | Thermal isolation using vertical structures | Performing Operations; Transporting | 1 | Expired |
| US8703003B2 | Selective etching of semiconductor substrate(s) that preserves underlying dielectric layers | Electricity | 0 | Active |
| US9576824B2 | Etching chamber with subchamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.