Laurent Pain
8Patents
2h-index
13Co-inventors
44Inventor score
Filing activity: Aug 9, 2004 → Dec 20, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7202153B2 | Method for forming, under a thin layer of a first material, portions of another material and/or empty areas | Electricity | 4 | Expired |
| US9156306B2 | Lithography method for doubled pitch | Electricity | 3 | Active |
| US7955914B2 | Method of producing an asymmetric architecture semi-conductor device | Electricity | 0 | Active |
| US8889550B2 | Lithographic method for making networks of conductors connected by vias | Electricity | 0 | Active |
| US7897308B2 | Method for transferring a predetermined pattern reducing proximity effects | Emerging Cross-Sectional Technologies | 0 | Active |
| US7767104B2 | Method for repairing errors of patterns embodied in thin layers | Electricity | 0 | Expired |
| US10845705B2 | Method for forming a chemical guiding structure on a substrate and chemoepitaxy method | Performing Operations; Transporting | 0 | Active |
| US8252638B2 | Method for forming under a thin layer of a first material portions of another material and/or empty areas | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.