Lynn Forester
8Patents
6h-index
7Co-inventors
52Inventor score
Filing activity: May 23, 1996 → Jul 23, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6080526A | Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation | Emerging Cross-Sectional Technologies | 83 | Expired |
| US6042994A | Nanoporous silica dielectric films modified by electron beam exposure and having low dielectric constant and low water content | Electricity | 45 | Expired |
| US6943051B2 | Method of fabricating heterojunction photodiodes integrated with CMOS | Electricity | 34 | Expired |
| US5952243A | Removal rate behavior of spin-on dielectrics with chemical mechanical polish | Electricity | 29 | Expired |
| US7265006B2 | Method of fabricating heterojunction devices integrated with CMOS | Electricity | 16 | Expired |
| US6652922B1 | Electron-beam processed films for microelectronics structures | Electricity | 12 | Expired |
| US6656532B2 | Layered hard mask and dielectric materials and methods therefor | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8816443B2 | Method of fabricating heterojunction photodiodes with CMOS | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.