Mandar B. Pandit
17Patents
6h-index
45Co-inventors
62Inventor score
Filing activity: Oct 22, 2004 → Jul 10, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9343272B1 | Self-aligned process | Electricity | 147 | Active |
| US9355862B2 | Fluorine-based hardmask removal | Electricity | 147 | Active |
| US9373522B1 | Titanium nitride removal | Electricity | 140 | Active |
| US9478434B2 | Chlorine-based hardmask removal | Electricity | 133 | Active |
| US9721784B2 | Ultra-conformal carbon film deposition | Electricity | 23 | Active |
| US9659769B1 | Tensile dielectric films using UV curing | Electricity | 6 | Active |
| US9390910B2 | Gas flow profile modulated control of overlay in plasma CVD films | Electricity | 5 | Active |
| US10074534B2 | Ultra-conformal carbon film deposition | Electricity | 5 | Active |
| US10373822B2 | Gas flow profile modulated control of overlay in plasma CVD films | Electricity | 2 | Active |
| US9837265B2 | Gas flow profile modulated control of overlay in plasma CVD films | Electricity | 1 | Active |
| US11699623B2 | Systems and methods for analyzing defects in CVD films | Electricity | 1 | Active |
| US10566206B2 | Systems and methods for anisotropic material breakthrough | Electricity | 0 | Active |
| US12300554B2 | Systems and methods for analyzing defects in CVD films | Electricity | 0 | Active |
| US10490406B2 | Systems and methods for material breakthrough | Electricity | 0 | Active |
| US10354889B2 | Non-halogen etching of silicon-containing materials | Electricity | 0 | Active |
| US9355820B2 | Methods for removing carbon containing films | Electricity | 0 | Active |
| US9337314B2 | Technique for selectively processing three dimensional device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.