Mohammad T. Islam
11Patents
2h-index
26Co-inventors
46Inventor score
Filing activity: Aug 30, 2013 → Oct 22, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9102034B2 | Method of chemical mechanical polishing a substrate | Electricity | 3 | Active |
| US10569384B1 | Chemical mechanical polishing pad and polishing method | Electricity | 2 | Active |
| US11285577B2 | Thin film fluoropolymer composite CMP polishing method | Chemistry; Metallurgy | 1 | Active |
| US10293456B2 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Electricity | 1 | Active |
| US10464188B1 | Chemical mechanical polishing pad and polishing method | Chemistry; Metallurgy | 1 | Active |
| US10086494B2 | High planarization efficiency chemical mechanical polishing pads and methods of making | Performing Operations; Transporting | 1 | Active |
| US11329373B1 | Planar antenna for wireless communication | Electricity | 0 | Active |
| US10207388B2 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Electricity | 0 | Active |
| US11491605B2 | Fluopolymer composite CMP polishing method | Electricity | 0 | Active |
| US12138737B2 | CMP polishing pad with enhanced rate | Performing Operations; Transporting | 0 | Active |
| US11638978B2 | Low-debris fluopolymer composite CMP polishing pad | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.