Sandeep Mehta
19Patents
6h-index
30Co-inventors
66Inventor score
Filing activity: Oct 29, 1990 → Apr 30, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9099423B2 | Doped semiconductor films and processing | Electricity | 397 | Active |
| US5220497A | Method and apparatus for controlling high speed vehicles | Physics | 33 | Expired |
| US6756600B2 | Ion implantation with improved ion source life expectancy | Electricity | 27 | Expired |
| US7326937B2 | Plasma ion implantation systems and methods using solid source of dopant material | Electricity | 11 | Expired |
| US7544957B2 | Non-uniform ion implantation | Electricity | 11 | Active |
| US7464400B2 | Distributed environment controlled access facility | Electricity | 6 | Expired |
| US8620702B2 | Method and system for research and development management in an enterprise | Physics | 5 | Active |
| US7993698B2 | Techniques for temperature controlled ion implantation | Electricity | 4 | Active |
| US9054652B2 | Using fractional delay computations to improve intermodulation performance | Electricity | 1 | Active |
| US7886342B2 | Distributed environment controlled access facility | Electricity | 1 | Active |
| US9755583B2 | Using fractional delay computations to improve intermodulation performance | Electricity | 0 | Active |
| US11580477B2 | Method and system for managing research and development in an enterprise | Physics | 0 | Active |
| US10586194B2 | Method and system for managing research and development in an enterprise | Physics | 0 | Active |
| US7459703B2 | Ion implant beam angle integrity monitoring and adjusting | Electricity | 0 | Expired |
| US8954795B2 | System and method for responding to failure of a hardware locus at a communication installation | Physics | 0 | Active |
| US7378335B2 | Plasma implantation of deuterium for passivation of semiconductor-device interfaces | Electricity | 0 | Expired |
| US11514093B2 | Method and system for technical language processing | Physics | 0 | Active |
| US7544959B2 | In situ surface contamination removal for ion implanting | Electricity | 0 | Active |
| US8074111B1 | System and method for responding to failure of a hardware locus at a communication installation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.