Sangheon Lee
67Patents
8h-index
139Co-inventors
81Inventor score
Filing activity: Jun 24, 2003 → Jun 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7084070B1 | Treatment for corrosion in substrate processing | Electricity | 231 | Expired |
| US7390749B2 | Self-aligned pitch reduction | Electricity | 35 | Active |
| US7294580B2 | Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition | Electricity | 22 | Expired |
| US7250371B2 | Reduction of feature critical dimensions | Electricity | 17 | Expired |
| US8919154B2 | Washing machine | Textiles; Paper | 12 | Active |
| US9045853B2 | Laundry treating apparatus | Textiles; Paper | 11 | Active |
| US7910489B2 | Infinitely selective photoresist mask etch | Electricity | 9 | Active |
| US7695632B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 8 | Active |
| US8997290B2 | Method for washing and washing machine | Textiles; Paper | 8 | Active |
| US9959659B2 | Tile-based rendering apparatus and method for rendering 3D graphics using binning information and property information | Physics | 5 | Active |
| US9852070B2 | Cache memory system using a tag comparator to determine update candidates and operating method thereof | Physics | 5 | Active |
| US7192531B1 | In-situ plug fill | Electricity | 5 | Expired |
| US7541291B2 | Reduction of feature critical dimensions | Electricity | 5 | Active |
| US8268118B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 5 | Active |
| US9121125B2 | Method for washing and washing machine | Textiles; Paper | 4 | Active |
| US9080274B2 | Washing method and washing machine | Textiles; Paper | 4 | Active |
| US7098130B1 | Method of forming dual damascene structure | Electricity | 3 | Expired |
| US11828355B1 | Disconnector apparatus | Mechanical Engineering; Lighting; Heating | 3 | Active |
| US9966274B2 | Method of generating plasma in remote plasma source and method of fabricating semiconductor device using the same method | Electricity | 3 | Active |
| US7560388B2 | Self-aligned pitch reduction | Electricity | 3 | Active |
| US10482033B2 | Method and device for controlling memory | Physics | 3 | Active |
| US10455629B2 | Gateway, network assignment method of gateway, MME, network assignment method of MME, terminal, and network connection method of terminal in wireless communication system | Electricity | 2 | Active |
| US6979579B1 | Methods and apparatus for inspecting contact openings in a plasma processing system | Electricity | 2 | Expired |
| US8614149B2 | Critical dimension reduction and roughness control | Emerging Cross-Sectional Technologies | 2 | Active |
| US8357434B1 | Apparatus for the deposition of a conformal film on a substrate and methods therefor | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.