Seung-Young Son
14Patents
4h-index
22Co-inventors
60Inventor score
Filing activity: Dec 17, 2002 → Nov 3, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6867096B2 | Method of fabricating semiconductor device having capacitor | Electricity | 8 | Expired |
| US9653311B1 | 3D NAND staircase CD fabrication utilizing ruthenium material | Electricity | 8 | Active |
| US7098135B2 | Semiconductor device including bit line formed using damascene technique and method of fabricating the same | Electricity | 5 | Expired |
| US7226867B2 | Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas | Electricity | 4 | Expired |
| US6927126B2 | Method of manufacturing semiconductor device with interconnections and interconnection contacts and a device formed thereby | Electricity | 4 | Expired |
| US6753221B2 | Methods for fabricating semiconductor devices having capacitors | Electricity | 3 | Expired |
| US7291531B2 | Method of fabricating semiconductor device having capacitor | Electricity | 2 | Expired |
| US6875690B2 | Semiconductor device having self-aligned contact plug and method for fabricating the same | Electricity | 1 | Expired |
| US7307703B2 | Methods of determining an etching end point based on compensation for etching disturbances | Physics | 0 | Expired |
| US12255055B2 | Integrated cleaning process for substrate etching | Electricity | 0 | Active |
| US7256143B2 | Semiconductor device having self-aligned contact plug and method for fabricating the same | Electricity | 0 | Expired |
| US11521838B2 | Integrated cleaning process for substrate etching | Electricity | 0 | Active |
| US7736970B2 | Method of fabricating semiconductor device having capacitor | Electricity | 0 | Active |
| US8941165B2 | Methods of fabricating integrated circuit capacitors having u-shaped lower capacitor electrodes | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.