Innopad, Inc.
10Patents
10Active
10Granted
50Portfolio score
Filing activity: Jun 15, 2006 → Jan 27, 2010 · 8 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8172648B2 | Chemical-mechanical planarization pad | Performing Operations; Transporting | 13 | Active |
| US8137166B2 | Polishing pad having micro-grooves on the pad surface | Performing Operations; Transporting | 3 | Active |
| US7985121B2 | Chemical-mechanical planarization pad having end point detection window | Performing Operations; Transporting | 2 | Active |
| US8430721B2 | Chemical-mechanical planarization pad | Performing Operations; Transporting | 1 | Active |
| US8491360B2 | Three-dimensional network in CMP pad | Performing Operations; Transporting | 1 | Active |
| US7534163B2 | Polishing pad | Chemistry; Metallurgy | 1 | Active |
| US7357704B2 | Polishing pad | Chemistry; Metallurgy | 1 | Active |
| US8435099B2 | Chemical-mechanical planarization pad including patterned structural domains | Performing Operations; Transporting | 0 | Active |
| US8546260B2 | Fabric containing non-crimped fibers and methods of manufacture | Textiles; Paper | 0 | Active |
| US8377351B2 | Polishing pad with controlled void formation | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.