SPP TECHNOLOGIES, CO., LTD.
16Patents
15Active
16Granted
47Portfolio score
Filing activity: Jul 27, 2007 → Mar 19, 2020 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8518283B2 | Plasma etching method capable of detecting end point and plasma etching device therefor | Electricity | 5 | Active |
| US9123542B2 | Plasma etching method | Electricity | 3 | Active |
| US8859434B2 | Etching method | Electricity | 1 | Active |
| US11195697B2 | Plasma control apparatus | Electricity | 1 | Active |
| US10280084B2 | Silicon nitride film and method of making thereof | Electricity | 0 | Active |
| US10559459B2 | Method for producing silicon nitride film and silicon nitride film | Electricity | 0 | Active |
| US11785184B2 | Maintenance support system, maintenance support method, and program | Physics | 0 | Active |
| US8628676B2 | Plasma etching method | Electricity | 0 | Active |
| US11393664B2 | Substrate placing table, plasma processing apparatus provided with same, and plasma processing method | Electricity | 0 | Active |
| US9117660B2 | Apparatus, method and program for manufacturing nitride film | Electricity | 0 | Active |
| US8771461B2 | Plasma processing apparatus | Electricity | 0 | Active |
| US11361949B2 | Substrate placing table, plasma processing apparatus provided with same, and plasma processing method | General | 0 | Revoked |
| US10204768B2 | Etching device, plasma processing device | Electricity | 0 | Active |
| US12243210B2 | Maintenance support system, maintenance support method, program, method for generating processed image, and processed image | Physics | 0 | Active |
| US8546265B2 | Method, apparatus and program for manufacturing silicon structure | Electricity | 0 | Active |
| US8852388B2 | Plasma processor | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.