Chieh-Han Wu
15Patents
3h-index
20Co-inventors
56Inventor score
Filing activity: Dec 19, 2013 → Apr 17, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9576814B2 | Method of spacer patterning to form a target integrated circuit pattern | Electricity | 2,776 | Active |
| US9184054B1 | Method for integrated circuit patterning | Electricity | 751 | Active |
| US9136106B2 | Method for integrated circuit patterning | Electricity | 11 | Active |
| US9418886B1 | Method of forming conductive features | Electricity | 3 | Active |
| US11251118B2 | Self-aligned via structures with barrier layers | Electricity | 2 | Active |
| US11631639B2 | Method of fabricating self-aligned via structures | Electricity | 1 | Active |
| US12165920B2 | Semiconductor structure and method for forming the same | Electricity | 0 | Active |
| US9418862B2 | Method for integrated circuit patterning | Electricity | 0 | Active |
| US9640397B2 | Method of fabricating a semiconductor integrated circuit using a directed self-assembly block copolymer | Electricity | 0 | Active |
| US9653349B2 | Semiconductor integrated circuit with nano gap | Electricity | 0 | Active |
| US12046551B2 | Interconnect structure having a barrier layer along the sidewall of self-aligned via structures | Electricity | 0 | Active |
| US10049919B2 | Semiconductor device including a target integrated circuit pattern | Electricity | 0 | Active |
| US11676862B2 | Semiconductor device structure and methods of forming the same | Electricity | 0 | Active |
| US11830910B2 | Semiconductor structure having air gaps and method for manufacturing the same | Electricity | 0 | Active |
| US11393718B2 | Semiconductor structure and method for forming the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.