Inventor · Austin, TX, US

Christopher H. Raeder

15Patents
9h-index
25Co-inventors
64Inventor score

Filing activity: May 8, 1998 → Oct 24, 2005

Most-cited inventions

PatentTitleAreaCited byStatus
US6540591B1 Method and apparatus for post-polish thickness and uniformity control Performing Operations; Transporting 56 Expired
US6276989A Method and apparatus for controlling within-wafer uniformity in chemical mechanical polishing Performing Operations; Transporting 46 Expired
US6284622A Method for filling trenches Electricity 41 Expired
US6106661A Polishing pad having a wear level indicator and system using the same Performing Operations; Transporting 21 Expired
US6155915A System and method for independent air bearing zoning for semiconductor polishing device Performing Operations; Transporting 18 Expired
US6331137A Polishing pad having open area which varies with distance from initial pad surface Emerging Cross-Sectional Technologies 17 Expired
US6452180B1 Infrared inspection for determining residual films on semiconductor devices Physics 16 Expired
US6454899B1 Apparatus for filling trenches Electricity 16 Expired
US6171174A System and method for controlling a multi-arm polishing tool Emerging Cross-Sectional Technologies 13 Expired
US6057068A Method for determining the efficiency of a planarization process Electricity 7 Expired
US6444564B1 Method and product for improved use of low k dielectric material among integrated circuit interconnect structures Electricity 5 Expired
US7008301B1 Polishing uniformity via pad conditioning Performing Operations; Transporting 3 Expired
US7307002B2 Non-critical complementary masking method for poly-1 definition in flash memory device fabrication Electricity 3 Expired
US6379216B1 Rotary chemical-mechanical polishing apparatus employing multiple fluid-bearing platens for semiconductor fabrication Performing Operations; Transporting 2 Expired
US7888269B2 Triple layer anti-reflective hard mask Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.