Hui-Chun Yang
14Patents
3h-index
23Co-inventors
56Inventor score
Filing activity: Aug 5, 2011 → Aug 20, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9812390B2 | Semiconductor devices including conductive features with capping layers and methods of forming the same | Electricity | 6 | Active |
| US9349689B2 | Semiconductor devices including conductive features with capping layers and methods of forming the same | Electricity | 5 | Active |
| US9054110B2 | Low-K dielectric layer and porogen | Electricity | 5 | Active |
| US9177918B2 | Apparatus and methods for low k dielectric layers | Electricity | 2 | Active |
| US8994178B2 | Interconnect structure and method for forming the same | Electricity | 2 | Active |
| US8889567B2 | Apparatus and methods for low K dielectric layers | Electricity | 2 | Active |
| US8959620B2 | System and method for composing an authentication password associated with an electronic device | Physics | 1 | Active |
| US9269614B2 | Method of forming semiconductor device using remote plasma treatment | Electricity | 1 | Active |
| US11593225B2 | Method and system for live-mounting database backups | Physics | 0 | Active |
| US11991494B2 | Keyless control device and earphone | Electricity | 0 | Active |
| US10134632B2 | Low-K dielectric layer and porogen | Electricity | 0 | Active |
| US8877083B2 | Surface treatment in the formation of interconnect structure | Electricity | 0 | Active |
| US9093265B2 | High UV curing efficiency for low-k dielectrics | Electricity | 0 | Active |
| US9564383B2 | Low-K dielectric layer and porogen | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.