Inventor · Tokyo, JP

Kazunori Shinoda

34Patents
5h-index
62Co-inventors
72Inventor score

Filing activity: Feb 21, 1985 → Apr 22, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US5912913A Vertical cavity surface emitting laser, optical transmitter-receiver module using the laser, and parallel processing system using the laser Electricity 61 Expired
US5844931A Semiconductor laser devices Electricity 16 Expired
US5064257A Optical heterodyne scanning type holography device Physics 12 Expired
US6989550B2 Distributed feedback semiconductor laser equipment employing a grating Electricity 7 Expired
US7502403B2 Semiconductor laser and optical module Electricity 6 Active
US4763996A Spatial light modulator Electricity 5 Expired
US5805316A Twin-image elimination apparatus and method Physics 5 Expired
US7583714B2 Vertical cavity surface emitting semiconductor laser device Electricity 4 Active
US6973226B2 Optoelectronic waveguiding device and optical modules Physics 4 Expired
US4677341A Synchronous scan streaking device Electricity 4 Expired
US7636378B2 Semiconductor laser diode Electricity 4 Active
US8855160B2 Horizontal-cavity surface-emitting laser Electricity 3 Active
US8774571B2 Optical device, optical module, and method for manufacturing optical device Electricity 3 Active
US7340142B1 Integrated optoelectronic device and method of fabricating the same Physics 2 Active
US7542208B2 Light collecting device and light collecting mirror Physics 2 Expired
US10325781B2 Etching method and etching apparatus Electricity 2 Active
US7577319B2 Semiconductor optical device and manufacturing method thereof Electricity 2 Active
US11915951B2 Plasma processing method Electricity 1 Active
US9110315B2 Optical device, modulator module, and method for manufacturing the optical device Electricity 1 Active
US6943957B2 Laser light source and an optical system for shaping light from a laser-bar-stack Electricity 1 Expired
US11217454B2 Plasma processing method and etching apparatus Electricity 1 Active
US10872779B2 Plasma etching method and plasma etching apparatus Electricity 0 Active
US11557463B2 Vacuum processing apparatus Electricity 0 Active
US12051574B2 Wafer processing method and plasma processing apparatus Electricity 0 Active
US10290472B2 Vacuum processing apparatus Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.