Keisuke NIIDA
16Patents
1h-index
17Co-inventors
43Inventor score
Filing activity: Nov 1, 2016 → Dec 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10864366B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | Electricity | 2 | Active |
| US10604618B2 | Compound, method for manufacturing the compound, and composition for forming organic film | Electricity | 1 | Active |
| US11022882B2 | Compound and composition for forming organic film | Electricity | 1 | Active |
| US12332567B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | Physics | 0 | Active |
| US11692066B2 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Physics | 0 | Active |
| US11851530B2 | Material for forming organic film, patterning process, and polymer | Chemistry; Metallurgy | 0 | Active |
| US11500292B2 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Chemistry; Metallurgy | 0 | Active |
| US10934463B2 | Adhesive film, method for forming an adhesive film, and urethane polymer | Chemistry; Metallurgy | 0 | Active |
| US11635691B2 | Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer | Chemistry; Metallurgy | 0 | Active |
| US12105420B2 | Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer | Physics | 0 | Active |
| US10109485B2 | Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process | Electricity | 0 | Active |
| US11676814B2 | Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Electricity | 0 | Active |
| US11181821B2 | Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer | Electricity | 0 | Active |
| US11307497B2 | Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Chemistry; Metallurgy | 0 | Active |
| US11886118B2 | Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film | Electricity | 0 | Active |
| US10998197B2 | Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.