Kenji Hinode
20Patents
9h-index
22Co-inventors
75Inventor score
Filing activity: May 5, 1987 → Feb 5, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6117775A | Polishing method | Electricity | 140 | Expired |
| US4897709A | Titanium nitride film in contact hole with large aspect ratio | Electricity | 114 | Expired |
| US4887146A | Semiconductor device | Emerging Cross-Sectional Technologies | 34 | Expired |
| US6376345B1 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 26 | Expired |
| US7947596B2 | Semiconductor device and method of manufacturing the same | Electricity | 23 | Active |
| US6596638B1 | Polishing method | Electricity | 22 | Expired |
| US6358838B2 | Semiconductor device and process for producing the same | Electricity | 17 | Expired |
| US7122900B2 | Semiconductor device and method manufacturing the same | Electricity | 10 | Expired |
| US6680541B2 | Semiconductor device and process for producing the same | Electricity | 9 | Expired |
| US6458674B1 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6531400B2 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7659201B2 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 6 | Active |
| US7081417B2 | Manufacturing method for electronic device and multiple layer circuits thereof | Electricity | 5 | Expired |
| US6800557B2 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 4 | Expired |
| US7132367B2 | Polishing method | Electricity | 2 | Expired |
| US6864584B2 | Semiconductor device | Electricity | 2 | Expired |
| US7510970B2 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7279425B2 | Polishing method | Electricity | 1 | Active |
| US7563716B2 | Polishing method | Electricity | 0 | Active |
| US8129275B2 | Process for manufacturing semiconductor integrated circuit device | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.