Kimihiro Matsuse
18Patents
11h-index
18Co-inventors
69Inventor score
Filing activity: Mar 21, 1989 → Aug 17, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6576062B2 | Film forming apparatus and film forming method | Chemistry; Metallurgy | 542 | Expired |
| US6454909B1 | Method and apparatus for forming a film on an object to be processed | Electricity | 327 | Expired |
| US5647945A | Vacuum processing apparatus | Emerging Cross-Sectional Technologies | 240 | Expired |
| US6861356B2 | Method of forming a barrier film and method of forming wiring structure and electrodes of semiconductor device having a barrier film | Electricity | 187 | Expired |
| US5951772A | Vacuum processing apparatus | Emerging Cross-Sectional Technologies | 48 | Expired |
| US5997651A | Heat treatment apparatus | Chemistry; Metallurgy | 39 | Expired |
| US4913790A | Treating method | Chemistry; Metallurgy | 34 | Expired |
| US6022586A | Method and apparatus for forming laminated thin films or layers | Chemistry; Metallurgy | 30 | Expired |
| US6251188A | Apparatus for forming laminated thin films or layers | Chemistry; Metallurgy | 30 | Expired |
| US6838376B2 | Method of forming semiconductor wiring structures | Electricity | 16 | Expired |
| US6251191A | Processing apparatus and processing system | Chemistry; Metallurgy | 16 | Expired |
| US6919273B1 | Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN film | Electricity | 9 | Expired |
| US7153773B2 | TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming system | Electricity | 7 | Expired |
| US7829144B2 | Method of forming a metal film for electrode | Electricity | 5 | Active |
| US6245673A | Method of forming tungsten silicide film | Electricity | 4 | Expired |
| US6404021B1 | Laminated structure and a method of forming the same | Electricity | 4 | Expired |
| US11114321B2 | Apparatus and method for real-time sensing of properties in industrial manufacturing equipment | Electricity | 0 | Active |
| US6489208B2 | Method of forming a laminated structure to enhance metal silicide adhesion on polycrystalline silicon | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.